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Aston™ 質譜分析儀安全地減少設備停機時間
預防性維護是良好晶圓廠管理與安全第一的理念支柱. 刻蝕和沉積設備必須定期離線進行深度清潔和/或打開工藝室進行部件更換. 考慮到沉積或蝕刻工藝設備的每小時折舊和生產損失可能輕易超過 1000美元/小時, 減少設備停機時間是至關重要的. 但是, 考慮到許多工具都有高度腐蝕性的清潔氣體或工藝副產物氣體, 如 HCl, NF3, HBr, HF, F, Cl? 如何安全地停機維護是一個挑戰.
Preventative maintenance is a pillar of good FAB management along with a safety-first mindset. Periodically etch and deposition tools must be taken off-line for deep cleans and/or parts replacement that involve opening-up the processing chamber. Minimizing the tool down time is critical given that the hourly depreciation and loss of production for a deposition or etch process tool can easily exceed $1000/hr. But how to take tools down safely is a challenge given that many tools have highly corrosive clean gases or process byproduct gasses e.g. HCl, NF3, HBr, HF, F, Cl?

問題
在打開腔室進行日常維護之前, 必須安全地清除腔室內的工藝副產品或清潔迴圈中的殘留工藝氣體, 然而, 挑戰在於如何確保腔室在打開之前是安全的並且沒有有害殘留氣體. 已知的唯一方法, 確保工藝室不含有害殘留氣體（包括由表面去吸收產生的殘留氣體）的唯一方法是運行（過長）長壓力迴圈吹掃氣體. 在沒有計量或回饋的情況下, 吹掃週期必須足夠長以確保腔室沒有有害物質, 這會導致效率低下, 週期長和設備停機時間長. 由於靈敏度和等離子體可用性的問題, 不能使用常見的計量解決方案, 例如光學發射光譜. 傳統的殘餘氣體分析儀在腐蝕性氣體環境中工作時面臨挑戰, 這可能導致電子衝擊燈絲在長吹掃週期中腐蝕和故障.
Residual process gases from process by-products or clean cycles inside the chamber must be safely removed prior to opening the chamber for routine maintenance. However, the challenge is how do you ensure that the chamber is safe and free of harmful residual gases prior to opening. Historically the only way to ensure that the process chamber is devoid of harmful residual gasses including those resulting from surface de-absorption is to run (excessively) long pressure cycling purge gas recipes. Without metrology or feedback the purge cycles must be long enough to ensure that the chamber is devoid of harmful material, this results in inefficient, long cycles and significant tool down time. The use of common metrology solutions such as optical emission spectroscopy cannot be used due to issues with sensitivity and plasma availability. Legacy residual gas analyzers are challenged working in corrosive gas environments that can lead to electron impact filament corrosion and failure during the long purge cycles.

伯東公司日本 Atonarp Aston™ 質譜分析儀安全地減少設備停機時間解決方案
Aston™ 原位質譜儀可以進行快速, 化學特異性原位定量氣體分析, 以實現安全, 準確和高效的腔室吹掃終點檢測. 與典型的基於時間的清洗程式相比, 這可以節省大量的設備停機時間. 由於 Aston™ 質譜分析儀可用於加速洩漏檢測和腔室老化到已知良好或極好腔室化學指征, 因此可以實現清潔後的進一步停機.在不需要等離子體的情況下, 每秒可以採集數十個樣本, 靈敏度低至 <100 PPB（十億分之幾）水準. 除了基於燈絲的電子碰撞電離源外, Aston Plasma 還提供內部等離子電離能力. 雙電離源支持較寬的工藝壓力範圍, 等離子電離允許分析較高壓力下的苛刻氣體, 而不會出現殘留氣體分析儀中常見的燈絲腐蝕問題.
Using Atonarp’s Aston in situ mass spectrometer allows for rapid, chemically specific in-situ quantitative gas analysis for safe, accurate and efficient chamber purge end point detection. This saves significant tool downtime
relative to typical time-based purge procedures. Further downtime after cleaning can be achieved as Aston can be used to accelerate leak detection and chamber seasoning to a known good or golden chamber chemical fingerprint. Without plasma needed, scores of samples per second with sensitivity down to <100 PPB (parts per billion) levels can be taken. Aston Plasma offers an internal plasma ionization capability in addition to a filament-based electron impact ionization source. Dual ionization sources support a wide process pressure range and plasma ionization allows for harsh gases at higher pressures to be analyzed without the typical problems of filament corrosion seen in residual gas analyzers.

通過減少設備停機時間和重新調試, 可以在不到 12 個月內實現投資回報, 此外, Aston™ 質譜分析儀還為現場過程監控和管理提供了價值優勢.
Return on investment in less than 12 months is achievable through the reduction of tool downtime and recommissioning and is in addition to the value benefits that Aston delivers for in-situ process monitoring and
management .

Aston™ 質譜分析儀是一種具有成本效益的解決方案, 可在日常維護和後續維護後投產調試前實現高效,安全的腔室清洗. 除了 Aston ™ 在沉積和蝕刻程序控制中提供的過程監控優勢外, 還可以通過一流的原位測量靈敏度和速度來顯著減少設備停機時間.
Aston from Atonarp is cost effective solution to enable efficient and safe chamber purge prior to routine maintenance and subsequent post-maintenance commissioning for production. Significant tool downtime reduction can be achieved through best-in-class sensitivity-with-speed for in-situ metrology in addition to process monitoring benefits that Aston delivers in deposition and etch process control.



若您需要進一步的瞭解 Atonarp Aston™ 在線質譜儀詳細資訊或討論, 請參考以下聯絡方式：
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