KRI 考夫曼離子源

伯東公司 主要經營產品 伯東國際通商股份有限公司為美國考夫曼公司離子源 Kuafman & Robinson,Inc 總代理. KRI 考夫曼離子源是由離子源發明人Dr.Kaufman 於1978年於美國所創立. KRI 考夫曼離子源歷經30年之改良及研發並取得多項專利, 目前已受各領域肯定.

KRI 考夫曼離子源之high ion bean current及high anode voltage, 加上有效面積廣大, EH1010F , EH1020F…係列, 在於鍍膜之前處理( ISSP)及助鍍(IABD)更有助於提高成膜之沉澱速率, 附著度, 可靠度, 增加折射率, 穿透率...KRI 考夫曼離子源整體設計有著低耗材成本, 安裝簡易, 維護簡單, 無論是在量產單位或是研發單位更是備受肯定及廣泛使用.

KRI 考夫曼離子源簡介

KRI 考夫曼離子源簡介之high ion bean current及high anode voltage, 加上有效面積廣大, EH1010F , EH1020F…係列, 在於鍍膜之前處理( ISSP)及助鍍(IABD)更有助於提高成膜之沉澱速率, 附著度, 可靠度, 增加折射率, 穿透率...KRI 考夫曼離子源整體設計有著低耗材成本, 安裝簡易, 維護簡單, 無論是在量產單位或是研發單位更是備受肯定及廣泛使用.

Power Supply and Control

KRI Ion Source Power Supply and Control

Model

AC Power

Controllers

DC Power

Controllers

RF Power

Controllers

Gas

Controllers

Automated System

Controllers

 

FC1000

DC150-x

RF1000

GC1000

AC1000

 

FC1006

DC300-x

RF1500

 

AC1000C

 

 

DC800-x

 

 

 

 

 

DC1000-x

 

 

 

 

離子源 eH 200

離子源 eH 200

Model

eH 200, eH 200 LEHO

Cathode / Neutralizer

Yes

Anode module

Yes

Process gases

Inert, reactive, organic

Power controller

eH Plasma Power Pack

 

eH 400

KRI Ion Source eH 400

Model

eH 400, eH 400 LEHO

Cathode / Neutralizer

Yes

Anode module

Yes

Process gases

Inert, reactive, organic

Power controller

eH Plasma Power Pack

eH 1020 F

KRI Ion Source eH 1020 F

Model

eH 1000 L, eH 1000, eH 1010, eH 1020, eH 1000 x O2, eH 1000 LEHO

Cathode / Neutralizer

Yes

Anode module

Yes

Process gases

Inert, reactive, organic

Power controller

eH Plasma Power Pack

eH 2000

KRI Ion Source eH 2000

Model

eH 2000 L, eH 2000, eH 2000 x O2, eH 2000 LEHO

Cathode / Neutralizer

Yes

Anode module

Yes

Process gases

Inert, reactive, organic

Power controller

eH Plasma Power Pack

eH Linear

KRI Ion Source eH Linear

Model

eHL 200-3, eHL 200-5, eHL 200-7

Height (nominal)

2.9 (7.4cm)

Width (nominal)

3.3 (8.4cm)

Length (nominal)

Determined by number of modules & application

Cathode/Neutralizer

Yes

RPICP 140

KRI Ion Source RPICP 140

Model

RFICP 140

Discharge

RF inductive

Filamentless

Yes

RF power

>0.5 kW

Ion optics

OptiBeamTM

RPICP 200

KRI Ion Source RPICP 200

Model

RFICP 200

Discharge

RF inductive

Filamentless

Yes

RF power

>0.5 kW

Ion optics

OptiBeamTM

RFICP 200 HO

KRI Ion Source RFICP 200 HO

Model

RFICP 200 HO

Discharge

RF inductive

Filamentless

Yes

RF power

>1 kW

Ion optics

OptiBeamTM

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